Lee Sung-Joo | Silicon Nano Device Laboratory, Department of Electrical and Computer Engineering, National University of Singapore, 10 Kent Ridge Crescent, Singapore 117576
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概要
- Lee Sung-Jooの詳細を見る
- 同名の論文著者
- Silicon Nano Device Laboratory, Department of Electrical and Computer Engineering, National University of Singapore, 10 Kent Ridge Crescent, Singapore 117576の論文著者
関連著者
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Lee Sung-Joo
Silicon Nano Device Laboratory, Department of Electrical and Computer Engineering, National University of Singapore, 10 Kent Ridge Crescent, Singapore 117576
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Kwong Dim-Lee
Institute of Microelectronics
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Li Rui
Silicon Nano Device Lab Department Of Ece National University Of Singapore
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Yang Wei-Feng
Silicon Nano Device Laboratory, Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117576
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Kwong Dim-Lee
Institute of Microelectronics, 11 Science Park Road, Singapore Science Park II, Singapore 117685
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Hong Ming-Hui
Department of Electrical and Computer Engineering, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260
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Chi Dong-Zhi
Institute of Materials Research and Engineering, 3 Research Link, Singapore 117602
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Whang Su-Jin
Silicon Nano Device Laboratory, Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117576
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Sun Zhi-Qiang
Silicon Nano Device Laboratory, Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117576
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Lee Sung-Joo
Silicon Nano Device Laboratory, Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117576
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Li Rui
Silicon Nano Device Laboratory, Department of Electrical and Computer Engineering, National University of Singapore, 10 Kent Ridge Crescent, Singapore 117576
著作論文
- Synthesis of Nickel Mono-Silicide Nanowire by Chemical Vapor Deposition on Nickel Film: Role of Surface Nickel Oxides
- Pt–Germanide Formed by Laser Annealing and Its Application for Schottky Source/Drain Metal–Oxide–Semiconductor Field-Effect Transistor Integrated with TaN/Chemical Vapor Deposition HfO2/Ge Gate Stack