Niwa Masaaki | ULSI Process Technology Development Center, Matsushita Electric Industrial Co., Ltd.
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- ULSI Process Technology Development Center, Matsushita Electric Industrial Co., Ltd.の論文著者
ULSI Process Technology Development Center, Matsushita Electric Industrial Co., Ltd. | 論文
- Transformation of Dense Contact Holes during SiO_2 Etching
- Improved Metal Gate Process by Simultaneous Gate-Oxide Nitridation during W/WN_x Gate Formation
- Improved Metal Gate Process by Simultaneous Gate-Oxide Nitridation during W/WNx Gate Formation
- Contact Hole Etch Scaling toward 0.1 μm
- Spatial and Temporal Behavior of Radicals in Inductively Coupled Plasm for SiO_2 Etching