Mishima Tomoyoshi | Advanced Electronic Materials Research Department, Research and Development Laboratory, Hitachi Cable, Ltd., 3550 Kidamari, Tsuchiura, Ibaraki 300-0026, Japan
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- 同名の論文著者
- Advanced Electronic Materials Research Department, Research and Development Laboratory, Hitachi Cable, Ltd., 3550 Kidamari, Tsuchiura, Ibaraki 300-0026, Japanの論文著者
Advanced Electronic Materials Research Department, Research and Development Laboratory, Hitachi Cable, Ltd., 3550 Kidamari, Tsuchiura, Ibaraki 300-0026, Japan | 論文
- Flux Pinning Characteristics in Tl Series Superconductors
- Improvement of Piezoelectric Properties of (K,Na)NbO3 Films Deposited by Sputtering
- Effect of Lattice Strain and Improvement of the Piezoelectric Properties of (K,Na)NbO3 Lead-Free Film
- Curie Temperature, Biaxial Elastic Modulus, and Thermal Expansion Coefficient of (K,Na)NbO3 Piezoelectric Thin Films
- Crystalline Structure of Highly Piezoelectric (K,Na)NbO3 Films Deposited by RF Magnetron Sputtering