Azuma Atsushi | Center for Semiconductor Research and Development, Toshiba Corp., Semiconductor Co., 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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概要
- Azuma Atsushiの詳細を見る
- 同名の論文著者
- Center for Semiconductor Research and Development, Toshiba Corp., Semiconductor Co., 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japanの論文著者
関連著者
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Kawanaka Shigeru
Center For Semiconductor Research & Development, Semiconductor Company, Toshiba Corporation
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Azuma Atsushi
Center for Semiconductor Research and Development, Toshiba Corp., Semiconductor Co., 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Toyoshima Yoshiaki
Center for Semiconductor Research and Development, Toshiba Corp., Semiconductor Co., 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Adachi Kanna
Center For Semiconductor Research & Development Toshiba Corporation Semiconductor Company
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Sato Motoyuki
Process & Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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SEKINE Katsuyuki
Process & Manufacturing Center, Semiconductor Company, Toshiba Corporation
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TAKAYANAGI Mariko
Center for Semiconductor Research & Development, Toshiba Corporation Semiconductor Company
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Itokawa Hiroshi
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Okamoto Hiroki
Center for Semiconductor Research and Development, Toshiba Corp., Semiconductor Co., 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Hokazono Akira
Center for Semiconductor Research and Development, Toshiba Corp., Semiconductor Co., 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Yasutake Nobuaki
Center for Semiconductor Research and Development, Toshiba Corp., Semiconductor Co., 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Okamoto Shintaro
System LSI Division, Toshiba Corp., Semiconductor Co., 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Kondo Masaki
Center for Semiconductor Research and Development, Toshiba Corp., Semiconductor Co., 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Tsujii Hideji
Center for Semiconductor Research and Development, Toshiba Corp., Semiconductor Co., 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Ishida Tatsuya
Center for Semiconductor Research and Development, Toshiba Corp., Semiconductor Co., 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Aoki Nobutoshi
Center for Semiconductor Research and Development, Toshiba Corp., Semiconductor Co., 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Fujiwara Makoto
Center for Semiconductor Research and Development, Toshiba Corp., Semiconductor Co., 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Azuma Atsushi
Center for Semiconductor Research and Development, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Toyoshima Yoshiaki
Center for Semiconductor Research and Development, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Nagatomo Koji
Center for Semiconductor Research and Development, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Watanabe Takeshi
Center for Semiconductor Research and Development, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Kojima Kenji
Center for Semiconductor Research and Development, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Itokawa Hiroshi
Process and Manufacturing Engineering Center, Toshiba Corp., Semiconductor Co., 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Kawanaka Shigeru
Center for Semiconductor Research and Development, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Kawanaka Shigeru
Center for Semiconductor Research and Development, Toshiba Corp., Semiconductor Co., 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Sekine Katsuyuki
Process and Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Takayanagi Mariko
Center for Semiconductor Research and Development, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Sato Motoyuki
Process and Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
著作論文
- In situ Doped Embedded-SiGe Source/Drain Technique for 32 nm Node p-Channel Metal–Oxide–Semiconductor Field-Effect Transistor
- Threshold Voltage Control of Hf-based High-$\kappa$ Gate Stack System by Fluorine Incorporation into Channel and Its Impact on Short-Channel Characteristics