Fukae Katsuya | New Products Development Division, Kanto Denka Kogyo Co., Ltd., 1-2-1 Marunouchi, Chiyoda, Tokyo 100-0005, Japan
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概要
- Fukae Katsuyaの詳細を見る
- 同名の論文著者
- New Products Development Division, Kanto Denka Kogyo Co., Ltd., 1-2-1 Marunouchi, Chiyoda, Tokyo 100-0005, Japanの論文著者
関連著者
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Miura Yutaka
Department Of Agricultural Chemistry Faculty Of Agriculture The University Of Tokyo
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Fukae Katsuya
New Products Development Division, Kanto Denka Kogyo Co., Ltd., 1-2-1 Marunouchi, Chiyoda, Tokyo 100-0005, Japan
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Habuka Hitoshi
Department of Chemical and Energy Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan
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Oda Satoko
Department Of Anatomy Toho University School Of Medicine
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Habuka Hitoshi
Department Of Chemical Engineering Science Yokohama National University
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Okumura Hajime
Power Electronics Research Center National Institute Of Advanced Industrial Science And Technology
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Arai Kazuo
Power Electronics Research Center National Institute Of Advanced Industrial Science And Technology (
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Okumura Hajime
Power Electronics Research Center, National Institute of Advanced Science and Technology, AIST Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Katsumi Yusuke
Department of Chemical and Energy Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan
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Fukai Yasushi
New Products Development Division, Kanto Denka Kogyo Co., Ltd., 1-2-1 Marunouchi, Chiyoda, Tokyo 100-0005, Japan
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Kato Tomohisa
Power Electronics Research Center, National Institute of Advanced Science and Technology, AIST Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Miura Yutaka
Department of Chemical and Energy Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan
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Takechi Naoto
New Products Development Division, Kanto Denka Kogyo Co., Ltd., 1-2-1 Marunouchi, Chiyoda, Tokyo 100-0005, Japan
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Kasahara Yu
Department of Chemical and Energy Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan
著作論文
- Determination of Etch Rate Behavior of 4H–SiC Using Chlorine Trifluoride Gas
- Etching Rate of Silicon Dioxide Using Chlorine Trifluoride Gas