Shamiryan Denis | IMEC and Electrical Engineering Department of Catholic University of Leuven, Belgium
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概要
- Shamiryan Denisの詳細を見る
- 同名の論文著者
- IMEC and Electrical Engineering Department of Catholic University of Leuven, Belgiumの論文著者
関連著者
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Shamiryan Denis
IMEC and Electrical Engineering Department of Catholic University of Leuven, Belgium
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Richard Olivier
imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgium
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de Marneffe
imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgium
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Lazzarino Frederic
imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgium
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Goossens Danny
imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgium
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Vandervorst Alain
imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgium
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Shamiryan Denis
imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgium
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Xu Kaidong
imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgium
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Truffert Vincent
imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgium
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Boullart Werner
imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgium
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Marneffe Jean-Fran\{c}ois
imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgium
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Shamiryan Denis
IMEC vzw, Kapeldreef 75, B-3001 Leuven, Belgium
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Mogilnikov Konstantin
Interuniversity Microelectronic Center (IMEC), Leuven, Belgium
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Baklanov Mikhail
Interuniversity Microelectronic Center (IMEC), Leuven, Belgium
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Petkov Mihail
Jet Propulsion Laboratory, California Institute of Technology, Pasadena, CA, USA
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Phillips Mark
SBA Materials, Inc., 9430-H San Mateo Blvd, NE Albuquerque, NM 87113, U.S.A.
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Verdonck Patrick
IMEC vzw, Kapeldreef 75, B-3001 Leuven, Belgium
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Smirnov Evgeny
IMEC vzw, Kapeldreef 75, B-3001 Leuven, Belgium
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Vanstreels Kris
IMEC vzw, Kapeldreef 75, B-3001 Leuven, Belgium
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Ciofi Ivan
IMEC vzw, Kapeldreef 75, B-3001 Leuven, Belgium
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Baklanov Mikhail
IMEC vzw, Kapeldreef 75, B-3001 Leuven, Belgium
著作論文
- Patterning of 25 nm Contact Holes at 90 nm Pitch: Combination of Line/Space Double Exposure Immersion Lithography and Plasma-Assisted Shrink Technology
- Evaluation of a New Advanced Low-$k$ Material
- A Discussion of the Practical Importance of Positron Annihilation Lifetime Spectroscopy Percolation Threshold in Evaluation of Porous Low-$K$ Dielectrics