A Discussion of the Practical Importance of Positron Annihilation Lifetime Spectroscopy Percolation Threshold in Evaluation of Porous Low-$K$ Dielectrics

スポンサーリンク

概要

• 論文の詳細を見る

• The pore connectivity threshold (percolation threshold) in porous low-$K$ dielectric films measured by Positron Annihilation Lifetime Spectroscopy (PALS) reflects only the interconnectivity of mesopores (2–50 nm size). Here we show direct evidence for molecular (toluene) diffusion at porosity values significantly below the PALS's percolation threshold. Therefore, the pores are still interconnected through intrinsic micropores (${<}2$ nm) in the low-$K$ film matrix. This implies that fundamental limitations may exist in the evaluation of pore interconnectivity and the integrity of diffusion barriers deposited on top of porous low-$K$ films by the detection of Ps escape.

• INSTITUTE OF PURE AND APPLIED PHYSICSの論文
• 2004-01-15

著者

• Shamiryan Denis

  IMEC and Electrical Engineering Department of Catholic University of Leuven, Belgium

• Mogilnikov Konstantin

  Interuniversity Microelectronic Center (IMEC), Leuven, Belgium

• Baklanov Mikhail

  Interuniversity Microelectronic Center (IMEC), Leuven, Belgium

• Petkov Mihail

  Jet Propulsion Laboratory, California Institute of Technology, Pasadena, CA, USA

関連論文

• Patterning of 25 nm Contact Holes at 90 nm Pitch: Combination of Line/Space Double Exposure Immersion Lithography and Plasma-Assisted Shrink Technology
• Evaluation of a New Advanced Low-$k$ Material
• A Discussion of the Practical Importance of Positron Annihilation Lifetime Spectroscopy Percolation Threshold in Evaluation of Porous Low-$K$ Dielectrics

スポンサーリンク