Goossens Danny | imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgium

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概要

• Goossens Dannyの詳細を見る
• 同名の論文著者
• imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgiumの論文著者

関連著者

• Richard Olivier

  imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgium

• de Marneffe

  imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgium

• Lazzarino Frederic

  imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgium

• Goossens Danny

  imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgium

• Vandervorst Alain

  imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgium

• Shamiryan Denis

  imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgium

• Xu Kaidong

  imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgium

• Truffert Vincent

  imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgium

• Boullart Werner

  imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgium

• Marneffe Jean-Fran\{c}ois

  imec v.z.w., Kapeldreef 75, B-3001 Leuven, Belgium

• Shamiryan Denis

  IMEC and Electrical Engineering Department of Catholic University of Leuven, Belgium

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著作論文

• Patterning of 25 nm Contact Holes at 90 nm Pitch: Combination of Line/Space Double Exposure Immersion Lithography and Plasma-Assisted Shrink Technology

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