Hideharu Shimizu | Taiyo Nippon Sanso Corporation, 10 Okubo, Tsukuba, Ibaraki 300-2611, Japan
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概要
- Hideharu Shimizu の詳細を見る
- 同名の論文著者
- Taiyo Nippon Sanso Corporation, 10 Okubo, Tsukuba, Ibaraki 300-2611, Japanの論文著者
関連著者
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Hideharu Shimizu
Taiyo Nippon Sanso Corporation, 10 Okubo, Tsukuba, Ibaraki 300-2611, Japan
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Satoshi Hasaka
Taiyo Nippon Sanso Corporation, 10 Okubo, Tsukuba, Ibaraki 300-2611, Japan
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Shuji Nagano
Taiyo Nippon Sanso Corporation, 10 Okubo, Tsukuba, Ibaraki 300-2611, Japan
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Nakahira Junya
Semiconductor Leading Edge Technologies Inc. (selete)
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Akifumi Gawase
Semiconductor Leading Edge Technologies, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Nagano Shuji
Taiyo Nippon Sanso Corporation, 10 Okubo, Tsukuba, Ibaraki 300-2611, Japan
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Gawase Akifumi
Semiconductor Leading Edge Technologies, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Yoshi Ohashi
Taiyo Nippon Sanso Corporation, 10 Okubo, Tsukuba, Ibaraki 300-2611, Japan
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Shinichi Chikaki
Semiconductor Leading Edge Technologies, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Noriaki Oda
Semiconductor Leading Edge Technologies, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Seiichi Kondo
Semiconductor Leading Edge Technologies, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Shuichi Saito
Semiconductor Leading Edge Technologies, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Yoshi Ohashi
Taiyo-Nippon Sanso Corp., Tsukuba, Ibaraki 300-2611, Japan
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Shuichi Saito
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Shinichi Chikaki
Semiconductor Leading Edge Technologies, Inc. (Selete), Tsukuba, Ibaraki 305-8569, Japan
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Ohashi Yoshi
Taiyo-Nippon Sanso Corp., Tsukuba, Ibaraki 300-2611, Japan
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Tajima Nobuo
National Institute for Material Science, Tsukuba, Ibaraki 305-0047, Japan
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Xu Yonghua
Tri Chemical Laboratories Inc., Uenohara, Yamanashi 409-0112, Japan
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Takeshi Kada
Tri Chemical Laboratories Inc., Uenohara, Yamanashi 409-0112, Japan
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Shuji Nagano
Taiyo-Nippon Sanso Corp., Tsukuba, Ibaraki 300-2611, Japan
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Noriaki Oda
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Hideharu Shimizu
Taiyo-Nippon Sanso Corp., Tsukuba, Ibaraki 300-2611, Japan
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Junya Nakahira
Semiconductor Leading Edge Technologies, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Nobuo Tajima
National Institute for Material Science, Tsukuba, Ibaraki 305-0047, Japan
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Yonghua Xu
Tri Chemical Laboratories Inc., Uenohara, Yamanashi 409-0112, Japan
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Satoshi Hasaka
Taiyo-Nippon Sanso Corp., Tsukuba, Ibaraki 300-2611, Japan
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Seiichi Kondo
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
著作論文
- Proposal of New Precursors for Plasma-Enhanced Chemical Vapor Deposition of SiOCH Low-$k$ Films with Plasma Damage Resistance
- High-Etching-Selectivity Barrier SiC ($k