UCHIDA Taijiro | ULVAC Japan, Ltd.
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概要
ULVAC Japan, Ltd. | 論文
- Usefulness of Magnetic Neutral Loop Discharge Plasma in Plasma Processing
- Realistic Etch Yield of Fluorocarbon ions in SiO_2 Etch Process
- Observation of Induction Power Dependence on the Magnetic Neutral Loop Discharge Plasma Thermalization Phenomena
- Measurements of Molecular Densities in Low Pressure Discharge Plasmas Using Laser Raman Scattering
- Operation of a CSL Gauge in Extremely High Vacuum