Li Tsung-lung | Department Of Applied Physics National Chia-yi University
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概要
関連著者
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Ting Jyh-hua
National Nano Device Laboratories
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Li Tsung-lung
Department Of Applied Physics National Chia-yi University
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Kung Chung-yuan
Department Of Electrical Engineering National Chung Hsing University
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Ting J‐h
National Nano Device Laboratories
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Li T‐l
Department Of Applied Physics National Chia-yi University
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LI Tsung-Lung
Department of Applied Physics, National Chia-Yi University
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Ting Jyh-Hua
National Nano Device Laboratories, 26 Prosperity Road I, Science-Based Industrial Park, Hsinchu 30078, Taiwan, R.O.C.
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Li Tsung-Lung
Department of Applied Physics, National Chia-Yi University, 300 Hsueh-Fu Road, Chiayi 60004, Taiwan, R.O.C.
著作論文
- Optimal Temperature-Time Condition for the Post-Exposure Bake Process of Deep-UV Resists : Semiconductors
- Time Dependence of the Reaction-Diffusion Simulation of the Postexposure Bake Process of Deep-Ultraviolet Resists(Semiconductors)
- Temporal Saturation Effects of Nanoscale Contact Holes Fabricated by Chemical Shrink Techniques
- Parallelizable Simulation of Material Effects of Chemical Shrink Process of Nanolithography