Oshima Akihiro | The Institute Of Scientific And Industrial Research Osaka University
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概要
関連著者
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Oshima Akihiro
The Institute Of Scientific And Industrial Research Osaka University
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Oshima Akihiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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TAGAWA Seiichi
Research Center for Nuclear Science and Technology, The University of Tokyo
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Washio Masakazu
Research Institute For Science And Engineering Waseda University
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Hasegawa Shigehiko
The Institute Of Scientific And Industrial Research Osaka University
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OYAMA Tomoko
Research Institute for Science and Engineering, Waseda University
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Tagawa Seiichi
Research Institute For Science And Engineering Waseda University
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Oyama Tomoko
Research Institute For Science And Engineering Waseda University
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Sakai Masamichi
Division of Material Science, Graduate School of Science and Engineering, Saitama University, Saitama 338-8570, Japan
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Sakuraba Takahito
Division of Material Science, Graduate School of Science and Engineering, Saitama University, Saitama 338-8570, Japan
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Honda Zentaro
Division of Material Science, Graduate School of Science and Engineering, Saitama University, Saitama 338-8570, Japan
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Kitajima Akira
The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
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Higuchi Koji
The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
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Nakamura Osamu
Core Technologies R&D Division, Casio Computer Co., Ltd., Ome, Tokyo 198-0022, Japan
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OKUBO Satoshi
Research Institute for Science and Engineering, Waseda University
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NAGASAWA Naotsugu
Quantum Beam Science Directorate, Japan Atomic Energy Agency
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KOBAYASHI Akinobu
Research Institute for Science and Engineering, Waseda University
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TAGUCHI Mitsumasa
Quantum Beam Science Directorate, Japan Atomic Energy Agency
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Okubo Satoshi
Research Institute For Science And Engineering Waseda University
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Hosaka Yuji
Research Institute Of Science And Engineering Waseda University
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ENOMOTO Kazuyuki
The Institute of Scientific and Industrial Research, Osaka University
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Taguchi Mitsumasa
Quantum Beam Science Directorate Japan Atomic Energy Agency
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Enomoto Kazuyuki
The Institute Of Scientific And Industrial Research Osaka University
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Kobayashi Akinobu
Research Institute For Science And Engineering Waseda University
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Nagasawa Naotsugu
Quantum Beam Science Directorate Japan Atomic Energy Agency
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Kodama Daisuke
Division of Material Science, Graduate School of Science and Engineering, Saitama University, Saitama 338-8570, Japan
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Nakamura Osamu
Core Technologies R&D Division, Casio Computer Co., Ltd., Ome, Tokyo 198-0022, Japan
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Hasegawa Shigehiko
The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
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Enomoto Kazuyuki
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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Oshima Akihiro
The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
著作論文
- Micro-/Nanofabrication of Cross-linked Poly(L-lactic acid) Using Electron Beam Nanoimprint Lithography
- Electron-Beam-Induced Decomposition Mechanisms of High-Sensitivity Chlorinated Resist ZEP520A
- Negative Magnetoresistance Generated by Combination of Spin--Orbit Interaction and Applied Magnetic Field
- Generation of Spin Current in Bipolar Conductors