Ueno Hiroshi | Semiconductor Research Laboratory Clarion Co. Ltd.
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概要
Semiconductor Research Laboratory Clarion Co. Ltd. | 論文
- Selective Growth of GaAs/Si by One-Step Low-Pressure Metalorganie Chemical Vapor Deposition
- Selective Epitaxial Growth by Ultrahigh-Vacuum Chemical Vapor Deposition with Alternating Gas Supply of Si_2H_6 and Cl_2
- Tunable Optical Stop Band and Reflection Peak in Synthetic Opal Infiltrated with Liquid Crystal and Conducting Polymer as Photonic Crystal
- Surface Defect Formation in Epitaxial Si Grown on Boron-Doped Substrates by Ultrahigh Vacuum Chemical Vapor Deposition(Structure and Mechanical and Thermal Properties of Condensed Matter)
- Significant Effects of As Ion Implantation on Si-selective Epitaxy by Ultrahigh Vacuum Chemical Vapor Deposition