ISHIKAWA K. | Advanced CMOS Technology Lab., Fujitsu Labs Ltd.

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概要

• 同名の論文著者
• Advanced CMOS Technology Lab., Fujitsu Labs Ltd.の論文著者

関連著者

• ISHIKAWA K.

  Advanced CMOS Technology Lab., Fujitsu Labs Ltd.

• ITO T.

  Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corp.

• Okagaki T.

  Device Ip Development Dept.

• Kihara F.

  Fujitsu Limited

• KUDO H.

  FUJITSU LABOTARORIES LIMITED

• MISHIMA Y.

  FUJITSU LABOTARORIES LIMITED

• SATOU S.

  FUJITSU LABOTARORIES LIMITED

• KUDO H.

  Advanced CMOS Technology Lab., Fujitsu Labs Ltd.

• MISHIMA Y.

  Advanced CMOS Technology Lab., Fujitsu Labs Ltd.

• SATOU S.

  Advanced CMOS Technology Lab., Fujitsu Labs Ltd.

• KIHARA F.

  MCU Technology, Dept., Fujitsu Ltd.

• OKAMATO M.

  MCU Technology, Dept., Fujitsu Ltd.

• SUZUKI Y.

  Process Integration Dept., Fujitsu Ltd.

• NOMURA T.

  Process Integration Dept., Fujitsu Ltd.

• KAWANO M.

  Process Integration Dept., Fujitsu Ltd.

• NISHIKAWA K.

  Process Engineering Dept., Fujitsu Ltd.

• OZAKI Y.

  Product Engineering Dept., Fujitsu Ltd.

• Okamato M.

  Fujitsu Limited

• Tanizawa M.

  Advanced Device Development Dept.

• TSUDA A.

  Device IP Development Dept.

• KUNIKIYO T.

  Device IP Development Dept.

• WATANABE T.

  Device IP Development Dept.

• NUNOGAMI H.

  Device IP Development Dept.

• UCHIDA A.

  Device IP Development Dept.

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著作論文

• Efficient Reduction of Standby Leakage Current in LSIs for Use in Mobile Devices
• Intrinsic Delay of Nanoscale MOSFETs under Ballistic Transport

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