Nakashita Toshio | Department Of Electrical Engineering Hiroshima University:(present Address) Department Of Applied Ph
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- Department Of Electrical Engineering Hiroshima University:(present Address) Department Of Applied Phの論文著者
Department Of Electrical Engineering Hiroshima University:(present Address) Department Of Applied Ph | 論文
- Effect of Annealing on Photoinduced Absorption in Amorphous Silicon Films Prepared at High Deposition Rates
- Changes of Structural, Electrical, and Optical Properties of Microcrystalline Si_xGe_ Films by Annealing
- Growth of Microcrystalline Si_xGe_ Alloy Films by Sputter-Assisted-Plasma CVD
- Dependence of Electronic Properties of Hydrogenated Amorphous Ge on Deposition Condition
- Defect States and Electronic Properties of Post-Hydrogenated CVD Amorphous Silicon