Furuhashi Masayuki | Department Of Electronics And Information Systems Osaka University
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概要
関連著者
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Tachi Masayuki
Department Of Electronics And Information Systems Osaka University
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Taniguchi Kenji
Department Of Biotechnology Tottori University
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Tsuji Hiroshi
Department Of Applied Physics Faculty Of Engineering Osaka City University
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Furuhashi Masayuki
Department Of Electronics And Information Systems Osaka University
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辻 博司
京都大学大学院工学研究科電子物性工学専攻
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TSUJI Hiroshi
Department of Electronic Science and Engineering, Kyoto University
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Tsuji Hiroshi
Department Of Electronics And Information Systems Osaka University
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TANIGUCHI Kenji
Department of Cancer Research, Fuji Gotemba Research Laboratories, Chugai and Pharmaceutical Co
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Taniguchi K
Osaka Univ. Osaka Jpn
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Furuhashi Masayuki
Department of Electronics and Information Systems, Osaka University
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Tachi Masayuki
Department of Electronics and Information Systems, Osaka University
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Hirose Tetsuya
Graduate School Of Engineering Kobe University
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Taniguchi Kenji
Department Of Electronics And Information Systems Osaka University
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Taniguchi K
Kyushu Univ.
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Hirama Toshiyasu
Research Center For Charged Particle Therapy National Institute Of Radiological Sciences
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Hirose Tetsuya
Kobe Univ. Kobe‐shi Jpn
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Furuhashi Masayuki
Department of Electronics and Information Systems, Osaka University, Osaka 565-0871, Japan
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Taniguchi Kenji
Department of Electronics and Information Systems, Osaka University, Osaka 565-0871, Japan
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Tsuji Hiroshi
Department of Electronics and Information Systems, Osaka University, Osaka 565-0871, Japan
著作論文
- Boron Emission Rate from Si/SiO_2 Interface Traps to Bulk Silicon for Dose Loss Modeling
- Role of Boron Atoms on Fluorine Diffusion under Various Stages of Annealing
- Anomalous Uphill Diffusion and Dose Loss of Ultra-Low-Energy Implanted Boron in Silicon during Early Stage of Annealing