KAWAHARA T. | Renesas Technology Corporation
スポンサーリンク
概要
関連著者
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KAWAHARA T.
Renesas Technology Corporation
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SAKASHITA S.
Renesas Technology Corporation
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YUGAMI J.
Renesas Technology Corporation
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WATANABE H.
Graduate School of Engineering, Osaka University
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Horie S.
Graduate School Of Engineering Osaka University
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KITANO N.
Graduate School of Engineering, Osaka University
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ARIMURA H.
Graduate School of Engineering, Osaka University
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HOSOI T.
Graduate School of Engineering, Osaka University
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SHIMURA T.
Graduate School of Engineering, Osaka University
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NISHIDA Y.
Renesas Technology Corporation
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MINAMI T.
Canon ANELVA Corporation
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KOSUDA M.
Canon ANELVA Corporation
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Yugami J.
Process Technology Development Div. Production And Technology Unit Renesas Technology Corp.
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KAWAHARA T.
Process Technology Development Div., Renesas Technology Corp.
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Yamanari S.
Process Technology Development Div. Production And Technology Unit Renesas Technology Corp.
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SAKASHITA S.
Process Technology Development Div., Production and Technology Unit, Renesas Technology Corp.
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MIZUTANI M.
Process Technology Development Div., Production and Technology Unit, Renesas Technology Corp.
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INOUE M.
Process Technology Development Div., Production and Technology Unit, Renesas Technology Corp.
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MORI K.
Process Technology Development Div., Production and Technology Unit, Renesas Technology Corp.
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HIGASHI M.
Process Technology Development Div., Production and Technology Unit, Renesas Technology Corp.
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NISHIDA Y.
Process Technology Development Div., Production and Technology Unit, Renesas Technology Corp.
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HONDA K.
Process Technology Development Div., Production and Technology Unit, Renesas Technology Corp.
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MURATA N.
Process Technology Development Div., Production and Technology Unit, Renesas Technology Corp.
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TSUCHIMOTO J.
Process Technology Development Div., Production and Technology Unit, Renesas Technology Corp.
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FUJIWARA K.
Process Technology Development Div., Production and Technology Unit, Renesas Technology Corp.
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YONEDA M.
Process Technology Development Div., Production and Technology Unit, Renesas Technology Corp.
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Tsuchimoto J.
Process Technology Development Div. Production And Technology Unit Renesas Technology Corp.
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Yoneda M.
Process Technology Development Div. Production And Technology Unit Renesas Technology Corp.
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Kawahara T.
Process Technology Development Div. Renesas Technology Corp.
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Arimura H.
Graduate School Of Engineering Osaka University
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Kitano N.
Graduate School Of Engineering Osaka University
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Mizutani M.
Process Technology Development Div. Production And Technology Unit Renesas Technology Corp.
著作論文
- Low Threshold Voltage Gate-First pMISFETs with Poly-Si/TiN/HfSiON Stacks Fabricated with PVD-based In-situ Solid Phase Interface Reaction (SPIR) Method
- Diffusion control technique in TiN stacked metal gate electrodes for p-MISFETs