Ota Hiroyuki | Mirai-advanced Semiconductor Research Center (mirai-asrc) National Institute Of Advanced Industrial
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Mirai-advanced Semiconductor Research Center (mirai-asrc) National Institute Of Advanced Industrial | 論文
- Anomalous positive V_ shift in HfAlO_x MOS gate stacks
- Importance of Leakage Current Noise Analysis for Accurate Lifetime Prediction of High-k Gate Dielectrics
- Weak Temperature Dependence of Non-Coulomb Scattering Component of HfAlO_x-Limited Inversion Layer Mobility in n^+-Polysilicon/HfAlO_x/SiO_2 N-Channel Metal-Oxide-Semiconductor Field-Effect Transistors
- Study on Oxynitride Buffer Layers in HfO_2 Metal-Insulator-Semiconductor Structures for Improving Metal-Insulator-Semiconductor Field-Effect Transistor Performance
- Degradation Mechanism of HfAlO_x/SiO_2 Stacked Gate Dielectric Films through Transient and Steady State Leakage Current Analysis