Aoi N | Assoc. Super‐advanced Electronics Technol. (aset) Kanagawa Jpn
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Assoc. Super‐advanced Electronics Technol. (aset) Kanagawa Jpn | 論文
- X-Ray Mask Distortion Induced in Back-Etching Preceding Subtractive Fabrication: Resist and Absorber Stress Effect
- Highly Sensitive and Stress-Free Chemically Amplified Negative Working Resist, TDUR-N9, for 0.1 μm Synchrotron Radiation (SR) Lithography
- Reduction of X-Ray Irradiation-Induced Pattern Displacement of SiN Membranes Usirng H^+ Ion Implantation Technique
- Ultrahigh-Vacuum Electron Cyclotron Resonance-Plasma Chemical-Vapor-Deposited SiN_x Films for X-Ray Lithography Mask Membrane : As-Deposited Properties and Radiation Stability
- Critical-Dimension Controllability of Chemically Amplified Resists for X-Ray Membrane Mask Fabrication