Shim Hong-ku | Department Of Chemistry And School Of Molecular Science (bk21) Korea Advanced Institute Of Science A
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- 同名の論文著者
- Department Of Chemistry And School Of Molecular Science (bk21) Korea Advanced Institute Of Science Aの論文著者
Department Of Chemistry And School Of Molecular Science (bk21) Korea Advanced Institute Of Science A | 論文
- Cyclopropyl-containing Photoacid Generators for Chemically Amplified Resists
- High Performance Molecular Resists Based on β-Cyclodextrin
- Silicon-containing Bilayer Resist Based on a Single Component Nonchemically Amplified Resist System
- Novel Molecular Resist Based on Derivative of Cholic Acid
- 193-nm Photoresists Based on Norbornene Copolymers with Derivatives of Bile Acid