SHIBAGAKI Masahiro | Research and Development Center
スポンサーリンク
概要
関連著者
-
Horiike Yasuhiro
Research And Development Center
-
SHIBAGAKI Masahiro
Research and Development Center
-
Horiike Yasuhiro
National Inst. For Materials Sci. Ibaraki Jpn
-
Horiike Yasuhiro
Biomaterials Center National Institute For Materials Science
-
Okano Haruo
Research And Development Center
-
Ueda Yoshiya
Toshiba Semiconductor Division Toshiba Corporation
-
SAGAWARA Takuji
Research and Development Center
-
Shibagaki Masahiro
Research And Development Center Toshiba Corporation
-
Horiike Yasuhiro
Development Of Material Science School Of Engineering University Of Tokyo
-
Horiike Yasuhiro
World Premier International (wpi) Research Center Initiative International Center For Materials Nano
著作論文
- Cl_2/Ar Plasma Etching of a Contaminated Layer on Si Induced by Fluorocarbon Gas Plasma
- Si and SiO_2 Etching Characteristics Using Reactive Ion Etching with CF_4-Cl_2 Gas Mixture