Hosawa Kosei | Research Center For Nanodevices And Systems Hiroshima University
スポンサーリンク
概要
関連著者
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Sano Kosuke
Research Center For Nanodevices And Systems Hiroshima University
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Hosoi Takuji
Research Center For Nanodevices And Systems Hiroshima University
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Hosawa Kosei
Research Center For Nanodevices And Systems Hiroshima University
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Shibahara Kentaro
Reseach Center for Nanodevices and Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashihiroshima, Hiroshima 739-8527, Japan
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Shibahara Kentaro
Research Center For Nanodevices And Systems Hiroshima University
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HOSAWA Kosei
Research Center for Nanodevices and Systems, Hiroshima University
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Sano Kosuke
Research Center for Nanodevices and Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashi-Hiroshima, Hiroshima 739-8527, Japan
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Hosawa Kosei
Research Center for Nanodevices and Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashi-Hiroshima, Hiroshima 739-8527, Japan
著作論文
- Pd_2Si Fully-Silicided Gate : Kinetics of Silicide Formation and Workfunction Tuning
- Formation Kinetics and Work Function Tuning of Pd2Si Fully Silicided Metal Gate