Noshiro H | Process Development Division Fujitsu Ltd.

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概要

• 同名の論文著者
• Process Development Division Fujitsu Ltd.の論文著者

関連著者

• Yamada M

  Ibaraki Univ. Ibaraki Jpn

• Yamada M

  Process Development Division Fujitsu Ltd.

• Yamada M

  Sony Corp. Tokyo Jpn

• NOSHIRO Hideyuki

  Process Development Division, Fujitsu Ltd.

• Otani Seigen

  The Authors Are With Advanced Material And Fram Development Dept. Ulsi Development Div. Fujitsu Limi

• Otani Seigen

  Advanced Technology Division Fujitsu Ltd.

• Takai K

  Kyoto Univ. Kyoto‐shi Jpn

• Noshiro H

  Process Development Division Fujitsu Ltd.

• TAMURA Tetsuro

  Process Development Division, Fujitsu Ltd.

• TAKAI Kazuaki

  Process Development Division, Fujitsu Ltd.

• KIMURA Mami

  Process Development Division, Fujitsu Ltd.

• OTANI Seigen

  Process Development Division, Fujitsu Ltd.

• YAMADA Masao

  Process Development Division, Fujitsu Ltd.

• YOSHIKAWA Kohta

  Advanced Technology Division, Fujitsu Ltd.

• KIMURA Takafumi

  Advanced Technology Division, Fujitsu Ltd.

• NOSHIRO Hideyuki

  Advanced Technology Division, Fujitsu Ltd.

• OTANI Seigen

  Advanced Technology Division, Fujitsu Ltd.

• YAMADA Masao

  Advanced Technology Division, Fujitsu Ltd.

• FURUMURA Yuji

  Advanced Technology Division, Fujitsu Ltd.

• Furumura Yuji

  Advanced Technology Division Fujitsu Ltd.

• Yoshikawa K

  Advanced Technology Division Fujitsu Ltd.

• Yoshikawa Kohta

  Advanced Technology Division Fujitsu Limited

• Kimura Mami

  Process Development Division Fujitsu Ltd.

• Otani Seigen

  Fujitsu Laboratories Ltd.

• Tamura T

  Silicon Technology Lab. Fujitsu Laboratories Ltd.

• Yamada Masao

  Advanced Technology Division Fujitsu Limited

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著作論文

• Influence of Electrode Contacts on Leakage Current of SrTiO_3 Capacitors
• RuO_2 Thin Films as Bottom Electrodes for High Dielectric Constant Materials

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