Yano T | Advanced Technology Research Laboratories Nippon Steel Corporation:(present Address)technical Develo
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概要
- YANO Takayukiの詳細を見る
- 同名の論文著者
- Advanced Technology Research Laboratories Nippon Steel Corporation:(present Address)technical Develoの論文著者
Advanced Technology Research Laboratories Nippon Steel Corporation:(present Address)technical Develo | 論文
- Analysis of Buried-Oxide Dielectric Breakdown Mechanism in Low-Dose Separation by Implanted Oxygen (SIMOX) Substrates Fabricated by Internal Thermal Oxidation (ITOX) Process
- Analysis of Buried-Oxide Dielectric Breakdown Mechanism in Low-Dose SIMOX Structures
- Evaluation of Fixed Charge and Interface Trap Densities in SIMOX Wafers and Their Effects on Device Characteristics
- Current-Path Observation in Low-Dose SIMOX (Separation by Implanted Oxygen) Buried-SiO_2 Layer
- Dislocation Density Reduction in SIMOX (Separation by Implanted Oxygen) Multi-Energy Single Implantation