Takechi Kazushige | Functional Devices Research Laboratories Nec Corp

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概要

• 同名の論文著者
• Functional Devices Research Laboratories Nec Corpの論文著者

関連著者

• Takechi Kazushige

  Functional Devices Research Laboratories Nec Corp

• Kaneko Setsuo

  Functional Devices And Material Research Nec Corporation

• KANEKO Setsuo

  Functional Devices Research Laboratories, NEC Corporation

• TAKECHI Kazushige

  Functional Devices Research Laboratories, NEC Corporation

• TAKAGI Tomoko

  Research and Development Division, ANELVA Corporation

• Kaneko S

  Functional Devices Research Laboratories Nec Corporation

• Takagi Toshio

  Faculty Of Science And Technology Keio University

• Takechi Kimihiro

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Ehime University

• Takagi T

  Faculty Of Science And Technology Keio University

• Takechi K

  Functional Devices Research Laboratories Nec Corporation

• Takagi Toru

  Electrical Communication Laboratories Nippon Telegraph And Telephone Public Corporation

• Chiang Chun-sung

  Department Of Electrical Engineering And Computer Science Center For Display Technology And Manufact

• Kanicki Jerzy

  Department Of Electrical Engineering And Computer Science Center For Display Technology And Manufact

• NISHIDA Shinichi

  Functional Devices Research Laboratories, NEC Corporation

• UCHIDA Hiroyuki

  Functional Devices Research Laboratories, NEC Corporation

• Nishida Shinichi

  Functional Devices Research Laboratories Nec Corporation

• Takechi Kazushige

  Functional Devices Research Laboratories Nec Corporation

• Uchida Hiroyuki

  Functional Devices Research Laboratories Nec Corporation

• Takechi Kazushige

  Functional Devices Research Laboratories, NEC Corporation,

• Takagi Tomoko

  Research and Development Division, ANELVA Corporation, 5-8-1 Yotsuya, Fuchu, Tokyo 183, Japan

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著作論文

• The Mechanism at Work in 40 MHz Discharge SiH_4/NH_3/N_2 Plasma Chemical Vapor Deposition of SIN_x Films at Very High Rates
• Performance of a-Si:H Thin Film Transistors Fabricated by Very High Frequency Discharge Silane Plasma Chemical Vapor Deposition
• High-Mobility and High-Stability a-Si:H Thin Film Transistors with Smooth SiN_x/a-Si Interface
• Electrical Instability of Hydrogenated Amorphous Silicon Thin-Film Transistors for Active-Matrix Liquid-Crystal Displays
• Performance of a-Si:H Thin Film Transistors Fabricated by Very High Frequency Discharge Silane Plasma Chemical Vapor Deposition

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