Sakai I | Microelectronics Engineering Labs. Toshiba Corporation
スポンサーリンク
概要
Microelectronics Engineering Labs. Toshiba Corporation | 論文
- Proximity Effect Correction For Electron Beam Lithography: Highly Accurate Correction Method
- Fabrication Process of Character Projection Mask for EB Lithography
- Fabrication of Micro-Marks for Electron-Beam Lithography
- Highly Uniform Low-Pressure Chemical Vapor Deposition (LP-CVD) of Si_3N_4 Film on Tungsten for Advanced Low-Resistivity "Polymetal" Gate Interconnects
- Plasma-Damage-Free Gate Process Using Chemical Mechanical Polishing for 0.1 μm MOSFETs