Uchida K | Advanced Lsi Technology Laboratory Research & Development Center Toshiba Corporation
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概要
Advanced Lsi Technology Laboratory Research & Development Center Toshiba Corporation | 論文
- Influence of Thermal Noise on Drain Current in Very Small Si-MOSFETs
- Influence of Intrinsic Current Fluctuation in Very Small Si-MOSFETs
- Current Fluctuation Characteristic of Sub-0.1 Micron Device Structures:A Monte Carlo Study
- Analytical Single-Electron Transistor(SET)Model for Design and Analysis of Realistic SET Circuits
- Probability Distribution of Threshold Voltage Fluctuations in Metal-OXide-Semiconductor Field-Effect-Transistors : Semiconductors