Nishitani M | Matsushita Electric Industrial Co.
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概要
Matsushita Electric Industrial Co. | 論文
- Measurement of Diffusion Coefficient of CF_2 Radical in DC Pulsed CF_4/H_2 Discharge Plasma
- Measurements of Diffusion Coefficient of CF_2 Radical in DC Pulsed CF_4/O_2 Discharge Plasma ( Plasma Processing)
- Effects of Fluorocarbon Films on CF Radical in CF_4/H_2 Plasma
- Wall Heating Effect on Crystallization of Low-Temperature Deposited Silicon Films from an Inductuvely-Coupled Plasma
- Reverse-Mode Single Ion Beam Induced Charge (R-mode SIBIC) Imaging for the Test of Total Dose Effects in n-ch Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET)