Vandervorst Wilfried | Imec
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概要
関連著者
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VANDERVORST Wilfried
IMEC, Kapeldreef
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Vandervorst Wilfried
Imec
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Conard Thierry
Interuniversity Micro Electronics Center (imec)
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Kimura Kenji
Department of Engineering Science, Kyoto University
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NAKAJIMA Kaoru
Department of Micro Engineering, Kyoto University
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Kimura Kenji
Department Of Micro Engineering Kyoto University
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Nakamura Kunio
Department Of Micro Engineering Kyoto University
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Nakajima Kaoru
Department Of Micro Engineering Kyoto University
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Nakajima Kaoru
Department Of Engineering Physics And Mechanics Kyoto University
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Conard Thierry
Imec
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BERGMAIER Andreas
Institut fur Angewandte Physik und Messtechnik, Universitat de Bundeswehr Munchen
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DOLLINGER Gunther
Institut fur Angewandte Physik und Messtechnik, Universitat de Bundeswehr Munchen
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Dollinger Gunther
Institut Fur Angewandte Physik Und Messtechnik Universitat De Bundeswehr Munchen
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Bergmaier Andreas
Institut Fur Angewandte Physik Und Messtechnik Universitat De Bundeswehr Munchen
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Kimura Kenji
Deparment Of Engineering Science Kyoto University
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Priolo Francesco
Matis Imm-cnr And Dipartimento Di Fisica E Astronomia Universita Di Catania
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IMPELLIZZERI Giuliana
MATIS IMM-CNR and Dipartimento di Fisica e Astronomia, Universita di Catania
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NAPOLITANI Enrico
MATIS IMM-CNR and Dipartimento di Fisica e Astronomia, Universita di Padova
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BONINELLI Simona
MATIS IMM-CNR and Dipartimento di Fisica e Astronomia, Universita di Catania
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PRIVITERA Vittorio
MATIS IMM-CNR and Dipartimento di Fisica e Astronomia, Universita di Catania
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CLARYSSE Trudo
imec
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Boninelli Simona
Matis Imm-cnr And Dipartimento Di Fisica E Astronomia Universita Di Catania
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Napolitani Enrico
Matis Imm-cnr And Dipartimento Di Fisica E Astronomia Universita Di Padova
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Privitera Vittorio
Matis Imm-cnr And Dipartimento Di Fisica E Astronomia Universita Di Catania
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Impellizzeri Giuliana
Matis Imm-cnr And Dipartimento Di Fisica E Astronomia Universita Di Catania
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Clarysse Trudo
imec, Kapeldreef 75, B-3001 Leuven, Belgium
著作論文
- Analysis of Ultra-Thin HfO_2/SiON/Si(001) : Comparison of Three Different Techniques
- Aluminum Implantation in Germanium : Uphill Diffusion, Electrical Activation, and Trapping