Niwa M | Ulsi Process Technology Development Center Matsushita Electric Industrial Co. Ltd.
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概要
- NIWA Masaakiの詳細を見る
- 同名の論文著者
- Ulsi Process Technology Development Center Matsushita Electric Industrial Co. Ltd.の論文著者
Ulsi Process Technology Development Center Matsushita Electric Industrial Co. Ltd. | 論文
- Transformation of Dense Contact Holes during SiO2 Etching
- Improved Metal Gate Process by Simultaneous Gate-Oxide Nitridation during W/WN_x Gate Formation
- Improved Metal Gate Process by Simultaneous Gate-Oxide Nitridation during W/WNx Gate Formation
- Contact Hole Etch Scaling toward 0.1 μm
- Spatial and Temporal Behavior of Radicals in Inductively Coupled Plasm for SiO_2 Etching