TAKADA Toshikazu | Fundamental Research Laboratories, NEC Corporation
スポンサーリンク
概要
関連著者
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ISHITANI Akihiko
ULSI Device Development Laboratories, NEC Corporation
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Mochizuki Yasunori
Institute Of Industrial Science University Of Tokyo
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Mochizuki Yasuhiro
Hitachi Research Laboratory Hitachi Ltd.
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Takada T
New Cosmos Electric Co. Ltd. Osaka Jpn
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Mochizuki Yuji
Fundamental Research Laboratories Nec Corporation
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TAKADA Toshikazu
Fundamental Research Laboratories, NEC Corporation
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Ishitani A
O Ntt Atsugi R&d Center:(permanant Address)semiconductor Company Matsushita Electronics Corporat
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Takada Toshikazu
Fundamental Research Laboratories Nec Corporation
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Ishitani Akihiko
Ulsi Device Development Laboratories Nec Corporation
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OKAMOTO Yasuharu
Fundamental Research Laboratories, NEC Corporation
著作論文
- On the Reaction Scheme for Ti/TiN Chemical Vapor Deposition (CVD) Process Using TiCl_4
- Theoretical Studies on the Dielectric Breakdown of the SiO_2 Thin Films