Tsai Jen-hwan | Department Of Applied Physics Chung-cheng Institute Of Technology
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概要
関連著者
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Tsai Jen-hwan
Department Of Applied Physics Chung-cheng Institute Of Technology
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LIAO Chin-Hsiung
Department of Applied Physics, Chung-Cheng Institute of Technology
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Yu Ann-ting
Department Of Mathematics And Physics Chinese Air Force Academy
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CHANG Liann-Be
Department of Electronic Engineering and Green Technology Research Center, Chang Gung University
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Chang L‐b
Chung Cheng Inst. Technol. Taoyuan Twn
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Chang Liann-be
Department Of Electronic Engineering Chang-gung University
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Chang Liann-be
Department Of Applied Physics Chung-cheng Institute Of Technology
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Lee C‐m
National Tsing Hua Univ. Hsinchu Twn
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Liao C‐h
Chinese Military Acad. Kao‐hsiung Twn
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Lee Cheng-min
Department Of Applied Physics Chung-cheng Institute Of Technology
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Lee Cheng-min
Department Of Applied Physics Chung Cheng Institute Of Technology
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TSAI Jen-Hwan
Department of Applied Physics, Chung-Cheng Institute of Technology
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Tsai Jen-hwan
Department Of Mathematics And Physics Chinese Air Force Academy
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SHEU Bor-Chiou
Department of Applied Physics, Chung-Cheng Institute of Technology
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Sheu Bor-chiou
Department Of Applied Physics Chung-cheng Institute Of Technology
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Yu Ann-Ting
Department of Mathematics and Physics, General Education Center, Chinese Air Force Academy, Kangshan, Kaohsiung 820, Taiwan, R.O.C
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Cheng Chien-Min
Department of Electrical Engineering, National Sun Yat-Sen University, Kaohsiung, Taiwan, R.O.C.
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Chen Kai-Huang
Department of Electrical Engineering, National Sun Yat-Sen University, Kaohsiung 804, Taiwan, R.O.C.
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Tsai Jen-Hwan
Department of Mathematics and Physics, General Education Center, Chinese Air Force Academy, Kangshan, Kaohsiung 820, Taiwan, R.O.C
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Liang Shu-Hua
Department of Electronic Engineering, Southern Taiwan University, Tainan 700, Taiwan, R.O.C.
著作論文
- Effects of a Metal Film and Prism Dielectric on Properties of Surface Plasmon Resonance in a Multilayer System
- Visible Photoluminescence from Si^+-Implanted SiO_2 Films after High-Temperature Rapid Thermal Annealing
- Dielectric and Piezoelectric Characteristics in Lead-Free Li[x](K.Na.)x(Nb.Ta.)O Piezoelectric Ceramics Prepared by Two-Step Calcination Method (Special Issue : Advanced Electromaterials)
- Photoluminescence Mechanisms in Si+-Implanted Dry SiO2 Films after Rapid Thermal Annealing at Dissociation Temperature of a-SiO2 Phase Variance