Muraoka Kouichi | Advanced Lsi Technology Labs Toshiba Corp.
スポンサーリンク
概要
関連著者
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Matsushita Daisuke
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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WATANABE Hiroshi
Advanced Science Research Center, Japan Atomic Energy Research Institute
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Muraoka Kouichi
Advanced Lsi Technology Labs Toshiba Corp.
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Muraoka Kouichi
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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Matsushita Daisuke
Advanced Lsi Technology Labs Toshiba Corp.
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Watanabe Hiroshi
Advanced Lsi Technology Labs Toshiba Corp.
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KATO Koichi
Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation
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Kato Koichi
Advanced Lsi Technology Labs Toshiba Corp.
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Kato Koichi
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
著作論文
- Leakage mechanism of ultrathin SiON gate dielectric
- Determination of tunnel mass and thickness of gate oxide including poly-Si/SiO_2 and Si/SiO_2 interfacial transition layers