Yeh Fon-shan | Institute Of Electrical Engineering National Tsing Hua University
スポンサーリンク
概要
関連著者
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Yeh Fon-shan
Institute Of Electrical Engineering National Tsing Hua University
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Tsai Tsung-ming
Institute Of Electronics National Chiao Tung University
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SZE Simon-M.
National Nano Device Laboratories
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CHANG Ting-Chang
National Nano Device Laboratories
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TSAI Ming-Shih
National Nano Device Laboratory
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CHEN Ben-Chang
National Nano Device Laboratory
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YANG Ya-Liang
National Nano Device Laboratory
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Liu Po-tsun
National Nano Device Lab.
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Chin Albert
Department Of Electronic Engineering National Chiao Tung University
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Tseng Tseung-yuen
Institute Of Electronics National Chiao Tung University
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Cheng Chun-Hu
Institute of Electronics Engineering, National Tsing Hua University, Hsinchu 300, Taiwan
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Huang Ching-Chien
Department of Electronics Engineering, National Chiao-Tung University, Hsinchu 300, Taiwan
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Liou Bo-Heng
Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu 300, Taiwan
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Sze Simon-M.
National Nano Device Laboratory, 1001-1 Ta-Hsueh Rd., Hsinchu 300, Taiwan, R.O.C.
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Tseng Tseung-Yuen
Institute of Electronics, National Chiao Tung University, 1001 Ta-Hsueh Rd., Hsinchu 300, Taiwan, R.O.C.
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Yeh Fon-Shan
Institute of Electronics Engineering, National Tsing Hua University, Hsinchu 300, Taiwan
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Chen Ben-Chang
National Nano Device Laboratory, 1001-1 Ta-Hsueh Rd., Hsinchu 300, Taiwan, R.O.C.
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Liu Po-Tsun
National Nano Device Laboratory, 1001-1 Ta-Hsueh Rd., Hsinchu 300, Taiwan, R.O.C.
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Tsai Ming-Shih
National Nano Device Laboratory, 1001-1 Ta-Hsueh Rd., Hsinchu 300, Taiwan, R.O.C.
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Tsai Tsung-Ming
Institute of Electronics, National Chiao Tung University, 1001 Ta-Hsueh Rd., Hsinchu 300, Taiwan, R.O.C.
著作論文
- Effect of Ta2O5 Doping on Electrical Characteristics of SrTiO3 Metal–Insulator–Metal Capacitors
- Elimination of Dielectric Degradation for Chemical-Mechanical Planarization of Low-$k$ Hydrogen Silisesquioxane