Kim N‐s | Systems On Silicon Manufacturing Co. Pte. Ltd. Singapore

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著作論文

Effect of Poly Metal Gate Etch Post-Cleaning on the Tail Distribution of DRAM Data Retention Time
Impact of Gate Etch Damage and Profile in High Density DRAM Cell
Impact of Polymetal Gate Etch Post-Cleaning on Data Retention Time in Sub-micron DRAM Cells
Low-Damage Gate Etching With High Degree of Anisotropy in High-Density DRAM Cell

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