Hirano Y | National Institute Of Advanced Industrial Science And Technology Aist Kansai Laboratory Of Purified
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- 同名の論文著者
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National Institute Of Advanced Industrial Science And Technology Aist Kansai Laboratory Of Purified | 論文
- Silicon Carbide Film Growth Using Dual Isotopical ^Si^- and ^C^+ Ion species
- Formation of High Purity films by Negative Ion Beam Sputtering Using an Ultra-high Vacuum Self-Sputtering Method
- Formation of Ultra High Pure Metal Thin Films by Means of a Dry Process
- Macroparticle-Free Ti-Al Films by Newly Developed Coaxial Vacuum Arc Deposition
- Fe Deposition or Implantation into Vacuum Arc Deposited Cr Films