KUBOTA Hitoshi | Spintronics Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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概要
- 同名の論文著者
- Spintronics Research Center, National Institute of Advanced Industrial Science and Technology (AIST)の論文著者
関連著者
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Yakushiji Kay
Spintronics Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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KUBOTA Hitoshi
Spintronics Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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FUKUSHIMA Akio
Spintronics Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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YUASA Shinji
Spintronics Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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Ando Koji
Spintronics Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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Yuasa Shinji
National Institute Of Advanced Industrial Science And Technology (aist) Spintronics Research Center
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Seki Takeshi
Graduate School Of Engineering Science Osaka University
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Fukushima Akio
National Institute Of Advanced Industrial Science And Technology (aist) Spintronics Research Center
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Kubota Hitoshi
National Institute Of Advanced Industrial Science And Technology (aist) Spintronics Research Center
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Yakushiji Kay
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Nagahama Taro
Spintronics Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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Ando K
Spintronics Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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NOMA Kenji
Spintronics Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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SARUYA Takeshi
Spintronics Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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ANDO Koji
Spintronics Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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Noma Kenji
Spintronics Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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Maehara Hiroki
Process Development Center Canon Anelva Corporation
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Nishimura Kazumasa
Process Development Center Canon Anelva Corporation
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Yuasa Shinji
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Tsunekawa Koji
Process Development Center Canon Anelva Corporation
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Ando Koji
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Nagamine Yoshinori
Process Development Center Canon Anelva Corporation
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Maehara Hiroki
Process Development Center, Canon ANELVA Corporation, Kawasaki 215-8550, Japan
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Tsunekawa Koji
Process Development Center, Canon ANELVA Corporation, Kawasaki 215-8550, Japan
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Seki Takayuki
Spintronics Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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Nagamine Yoshinori
Process Development Center, Canon ANELVA Corporation, Kawasaki 215-8550, Japan
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Yakushiji Kay
Spintronics Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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Yuasa Shinji
Spintronics Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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Kubota Hitoshi
Spintronics Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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Fukushima Akio
Spintronics Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
著作論文
- High Magnetoresistance Ratio and Low Resistance-Area Product in Magnetic Tunnel Junctions with Perpendicularly Magnetized Electrodes
- Tunnel Magnetoresistance above 170% and Resistance--Area Product of 1 $\Omega$ (μm)2 Attained by In situ Annealing of Ultra-Thin MgO Tunnel Barrier