Aya Yoichiro | Sanyo Electric Co. Ltd. Microelectronics Res. Cent.

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概要

• 同名の論文著者
• Sanyo Electric Co. Ltd. Microelectronics Res. Cent.の論文著者

関連著者

• Hamada Hiroki

  Sanyo Electric Co. Ltd. Microelectronics Res. Cent.

• Nohda Tomoyuki

  Sanyo Electric Co. Ltd.

• SEO Jin-Wook

  Department of Electrical Engineering, Faculty of Science and Technology, Keio University

• Aya Yoichiro

  Sanyo Electric Co. Ltd. Microelectronics Res. Cent.

• Kuwano Hiroshi

  Department Of Electrical Engineering Faculty Of Science And Technology Keio University

• Akiyama Satoru

  Department Of Electrical Engineering Faculty Of Science And Technology Keio University

• Kanaya Masatoshi

  Ion Engineering Research Institute

• Kajiyama Kenji

  Ion Engineering Research Institute

• Hamada H

  Hitachi Ltd. Tokyo Jpn

• NOHDA Tomoyuki

  Sanyo Electric Co., Ltd.

• KAJIYAMA Kenji

  Ion Engineering Research Institute Corporation

• KANAYA Masatoshi

  Ion Engineering Research Institute Corporation

• AYA Yoichiro

  SANYO Electric Co. Ltd., Microelectronics Res. Cent.

• KUWANO Hiroshi

  Department of Electrical Engineering, Faculty of Science and Technology, Keio University

• KOKUBO Yoshitaka

  Department of Electrical Engineering, Faculty of Science and Technology, Keio University

• Seo J‐w

  Chung‐ang Univ. Kyunggi‐do Kor

• Kajiyama Kenji

  Ion Engineering Research Institute Co.

• Kanaya Masatoshi

  Ion Engineering Research Institute Co.

• Nohda Tomoyuki

  SANYO Electric Co. Ltd., Microelectronics Res. Cent., 180, Ohmori, Anpachi-cho, Anpachi-gun, Gifu 503-0195, Japan

• Kokubo Yoshitaka

  Department of Electrical Engineering, Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Yokohama 223-8522, Japan

• Akiyama Satoru

  Department of Electrical Engineering, Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Yokohama 223-8522, Japan

• Kanaya Masatoshi

  Ion Engineering Research Institute Co., 2-8-1 Tsuda-Yamate, Hirakata, Osaka 573-0128, Japan

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著作論文

• Lateral Solid-Phase Recrystallization from the Crystal Seed Selectively Formed by Excimer Laser Annealing in Ge-Ion-Implanted Amorphous Silicon Films
• Lateral Solid Phase Recrystallization from the Crystal Seed in Ge-Ion-Implanted Amorphous Silicon Films by Repetition Rapid Thermal Annealing
• Lateral Solid-Phase Recrystallization from the Crystal Seed Selectively Formed by Excimer Laser Annealing in Ge-Ion-Implanted Amorphous Silicon Films

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