ONO Kouichi | The authors are with the Advanced Technology R&D Center, Mitsubishi Electric Corporation

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概要

• 同名の論文著者
• The authors are with the Advanced Technology R&D Center, Mitsubishi Electric Corporationの論文著者

関連著者

• 斧 高一

  京都大学大学院工学研究科

• Ono K

  Department Of Applied Chemistry The University Of Tokyo

• Ono K

  Advanced Technology R&d Center Mitsubishi Electric Corporation:(present Address)department Of Ae

• Ono K

  Univ. California Ca Usa

• KAWAHARA Toshio

  Department of Materials Science and Engineering, National Defense Academy

• Ono K

  The Faculty Of Engineering Ehime University

• Yamamuka M

  Mitsubishi Electric Corp. Hyogo Jpn

• Kawahara T

  Semiconductor Leading Edge Technol. Inc. Tsukuba-shi Jpn

• HORIKAWA Tsuyoshi

  The authors are with the Advanced Technology R&D Center, Mitsubishi Electric Corporation

• TANIMURA Junji

  The authors are with the Advanced Technology R&D Center, Mitsubishi Electric Corporation

• KAWAHARA Takaaki

  The authors are with the Advanced Technology R&D Center, Mitsubishi Electric Corporation

• YAMAMUKA Mikio

  The authors are with the Advanced Technology R&D Center, Mitsubishi Electric Corporation

• TARUTANI Masayoshi

  The authors are with the Advanced Technology R&D Center, Mitsubishi Electric Corporation

• ONO Kouichi

  The authors are with the Advanced Technology R&D Center, Mitsubishi Electric Corporation

• Tanimura Junji

  The Authors Are With The Advanced Technology R&d Center Mitsubishi Electric Corporation

• Horikawa Tsuyoshi

  Advanced Technology R&d Center Mitsubishi Electric Corporation

• Tarutani Masayoshi

  Advanced Technology R&d Center Mitsubishi Electric Corporation

• Kawahara T

  Faculty Of Technology Tokyo University Of Agriculture And Technology

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著作論文

• Effects of Post-Annealing on Dielectric Properties of (Ba, Sr)TiO_3 Thin Films Prepared by Liquid Source Chemical Vapor Deposition(Special Issue on Advanced Memory Devices Using High-ε and Ferroelectric Films)

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