Yoshida N | Keio Univ. Yokohama
スポンサーリンク
概要
関連著者
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Yoshida N
Keio Univ. Yokohama
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YOSHIDA Norihiro
Faculty of Technology, Tokyo University of Agriculture and Technology
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Nishina Yuichiro
Institute for Materials Research, Tohoku University
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Kobayashi Sota
Silicon Systems Research Laboratories Nec Corporation
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Kobayashi S
Science University Of Tokyo In Yamaguchi
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Kobayashi S
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology(aist)
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SASAKI Yoshiro
Institute for Materials Research,Tohoku University
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NISHITANI Ryusuke
Institute of Materials Science,University of Tsukuba
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Nishina Yuichiro
Institute For Materials Research (imr) Tohoku University
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Sasaki Yoshiro
Institute For Materials Research Tohoku University
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Yoshida Naoki
Institute For Materials Research Tohoku University
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Kobayashi Shunsuke
Science University Of Tokyo
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Nishitani R
Kyushu Inst. Technol. Fukuoka Jpn
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Nishitani Ryusuke
Institute Of Materials Science University Of Tsukuba
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Sasaki Y
Osaka Univ. Osaka
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Nishikawa M
Kent State Univ. Ohio Usa
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Yokoyama Y
Tonen Corp. Saitama
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Seo D‐s
Yonsei Univ. Seoul Kor
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Seo Dae-shik
Department Of Electrical Engineering College Of Engineering Soong Sil University
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Seo Dae-shik
Department Of Electrical And Computer Engineering Yonsei University
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Seo Dae-shik
Department Of Electrical And Electronic Engineering (a-226) College Of Engneering Yonsei University
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Seo Dae-shik
Department Of Electrical And Electronic Engineering College Of Engineering Yonsei University
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Seo Dae-shik
Department Of Electrical & Electronic Engineering. College Of Engineering Yonsei University
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SEO Dae-Shik
Division of Electronic and Information Engineering, Faculty of Technology, Tokyo University of Agric
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KOBAYASHI Shunsuke
Division of Electronic and Information Engineering, Faculty of Technology, Tokyo University of Agric
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Nishikawa Michinori
Tokyo Research Laboratory, Japan Synthetic Rubber Co., Ltd.
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YOSHIDA Norihiro
Division of Electronic and Information Engineering, Faculty of Technology, Tokyo University of Agric
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Kobayashi Shunsuke
Liquid Crystal Institute Science University Of Tokyo In Yamaguchi
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Seo Dae-shik
Division Of Electronic And Information Engineering Faculty Of Technology Tokyo University Of Agricul
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Yokoyama Y
Institute For Materials Research Tohoku University
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Yabe Y
Doshisha Univ. Kyoto Jpn
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Nishikawa Michinori
Tokyo Research Laboratory Japan Synthetic Rubber Co. Ltd.
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Kobayashi Shunsuke
Division Of Electronic And Information Engineering Graduate School Of Technology Tokyo University Of
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Kobayashi Shunsuke
Division Of Electronic And Information Engineering Faculty Of Technology Tokyo University Of Agricul
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Matsumoto Satoru
Department Of Electronics And Electrical Engineering Keio University
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Yabe Yoshikazu
Development Engineering Department, Fujitsu Kiden Co., Lid.
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HIGUCHI Hirofumi
Bentec Corporation
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Kobayashi Shunsuke
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology(aist)
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Matsumoto S
Ntt Telecommunications Energy Laboratories
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Chichibu S
Institute Of Applied Physics University Of Tsukuba
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Chichibu S
Institute Of Applied Physics And Graduate School Of Pure And Applied Sciences University Of Tsukuba
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Higuchi H
Matsushita Battery Industrial Co. Ltd. Osaka Jpn
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YOSHIDA Nobuhide
NEC Corporation
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TAKAHASHI Takashi
Department of General Medicine, Kanazawa Medical University
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Matsumoto Satoru
Department of Cardiology, Toyonaka Municipal Hospital
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IIMURA Yasufumi
The Institute of Physical and Chemical Research
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Iimura Y
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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Iimura Yasufumi
Division Of Electronic And Information Engineering Graduate School Of Technology Tokyo University Of
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Iimura Yasufumi
Faculty Of Technology Tokyo University Of Agriculture And Technology
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CHICHIBU Shigefusa
Institute of Applied Physics, University of Tsukuba
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Matsumoto S
Faculty Of Science And Technology Keio University
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MATSUMOTO Satoru
Faculty of Science and Technology, Keio University
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Imura Y
Japan Quality Assurance Organization Shizuoka Jpn
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OKABE Yutaka
Department of Physics,Tohoku University
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Harada Y
Univ. Tokyo Tokyo Jpn
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Harada Yoshinao
Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Harada Yoshinao
Ulsi Process Technology Development Center Matsushita Electronics Corp.
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YABE Yoshikazu
Display Development Engineering Department, Display Systems Engineering Division, Fujitsu Kiden Ltd.
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ARAYA Kazuo
Division of Electronic and Information Engineering, Faculty of Technology, Tokyo University of Agric
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CHICHIBU Shigefusa
Faculty of Science and Technology, Science University of Tokyo
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UCHIDA Mei
Faculty of Science and Technology, Keio University
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HARADA Yoshiyuki
Faculty of Science and Technology, Keio University
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SUDO Ryo
Faculty of Science and Technology, Keio University
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Akiyama H
Institute For Solid State Physics University Of Tokyo
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YOSHIDA-KATAYAMA Hiroshi
Department of Physics, Tohoku University
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Okabe Y
Department Of Physics Tohoku University
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Okabe Yutaka
Department Of Applied Chemistry Science And Engineering Waseda University
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AKIYAMA Hidenari
Faculty of Technology, Tokyo University of Agriculture and Technology
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NISHIKAWA Michinori
Japan Synthetic Rubber Co., Ltd.
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Sudo Ryo
Faculty Of Science And Technology Keio University
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Harada Y
Life Culture Department Seitoku University
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YOSHIDA Nobuhide
Faculty of Science and Technology, Keio University
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Ohkawa H
Toshiba Corp. Kanagawa
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MATSUBARA Motonari
Multimedia Engineering Laboratory, Toshiba Corporation
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OHKAWA Hideki
Multimedia Engineering Laboratory, Toshiba Corporation
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YOSHIMURA Tomohisa
Multimedia Engineering Laboratory, Toshiba Corporation
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YOSHIDA Nobuhisa
Multimedia Engineering Laboratory, Toshiba Corporation
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KOYAHARA Satoru
Toshiba Intelligent Technology Corporation
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CHICHIBU Shigefusa
Department of Electrical Engineering, Faculty of Science and Technology, Keio University
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YOSHIDA Nobuhide
Department of Electrical Engineering, Faculty of Science and Technology, Keio University
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MATSUBARA Motoki
Department of Electronic Science and Engineering, Kyoto University
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Chichibu Shigefusa
Department Of Electrical Engineering Keio University
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Takahashi Takashi
Department Of Applied Chemistry Tokyo Institute Of Technology
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Uchida M
Matsushita Electric Industrial Co. Ltd. Kyoto Jpn
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Araya Kazuo
Division Of Electronic And Information Engineering Faculty Of Technology Tokyo University Of Agricul
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Nishikawa Michinori
Japan Synthetic Rubber Co. Ltd.
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Yoshida Nobuhide
Department Of Electrical Engineering Faculty Of Science And Technology Keio University:(present Addr
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Akiyama H
National Inst. Materials And Chemical Res. Ibaraki Jpn
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Yoshida-katayama Hiroshi
Department Of Physics Tohoku University
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Matsubara Motonari
Department Of Electronic Science And Engineering Kyoto University
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Yoshimura Tomohisa
Multimedia Engineering Laboratory Toshiba Corporation
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Matsumoto Satoru
Faculty Of Science And Technology Keio University
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Takahashi Takashi
Department Of Applied Chemistry Graduate School Of Science And Engineering Tokyo Institute Of Techno
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TAKAHASHI Takashi
Department of Physics, Tohoku University
著作論文
- Anisotropic Dispersion Force Effects for Alignment of Liquid Crystals on Rubbed Polystyrene Surfaces
- Effect of the Polymer Tilt Angle for Generation of Pretilt Angle in Nematic Liquid Crystal on Rubbed Polyimide Surfaces
- Effects of Conjugation of Mesogenic Core of Nematic Liquid Crystals for Polar Anchoring Energy and Surface Order Parameter on Rubbed Polyimide Films
- Site-Dependent ^O Substitution in YBa_2Cu_3O_7 Studied by Raman Scattering Measurements
- Systematic Raman Scattering Study on Substitutional Effects in Solid Solution Systems of Ln_Ba_Cu_3O_y (Ln=Eu, Sm and La)
- Raman Scattering Study of the Effect of Nd Substitution into Ba Sites on the Phonon Spectrum of Nd_Ba_Cu_3O_y (x=0-0.4, y=〜7)
- In-Situ Raman Scattering Measurements of the Structural Phase Transition at Temperatures in High T_c-Oxide YBa_2Cu_3O_x : Electrical Properties of Condensed Matter
- Thermal Stability of Magnetically-Aligned Nematic Liquid Crystal Layer on Nonrubbed Polyimide Surface
- Low-Pressure Metalorganic Chemical Vapor Deposition of a CuGaSe_2/CuAlSe_2 Heterostructure
- Write-Once Optical Disk Using Ge-Sb-Te/Bi-Te Bilayer Film for Mark-Edge Recording
- Chemical Vapor Deposition of Cu Film on SiO_2 Using Cyclopentadienylcoppertriethylphosphine