Ozawa Yoshio | Toshiba Corporation
スポンサーリンク
概要
関連著者
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Ozawa Yoshio
Toshiba Corporation
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YAMAKOSHI Yoshiki
Faculty of Engineering, Gunma University
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MASUDA Nobuyuki
Faculty of Engineering. Gunma University
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OZAWA Yoshiyuki
Faculty of Engineering. Gunma University
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山越 芳樹
群馬大学大学院工学研究科
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山越 芳樹
群馬大学 工学部 電気電子工学科
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Yamakoshi Y
Faculty Of Engineering Gunma University
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Masuda Nobuyuki
Faculty Of Engineering Gunma University
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SUGIZAKI Taro
FUJITSU LABORATOIRES Ltd.
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NAKANISHI Toshiro
FUJITSU LABORATOIRES Ltd.
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Yamakoshi Yoshiki
Faculty Of Engineering Department Of Electric And Electronic Engineering Gunma University
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Ozawa Yoshiyuki
Faculty Of Engineering Gunma University
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MURAKOSHI Atsushi
Toshiba Corporation
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SUGURO Kyoichi
Toshiba Corporation
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CHELLY Nader
Faculty of Engineering. Gunma University
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山越 芳樹
群馬大工
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Chelly Nader
Faculty Of Engineering Gunma University
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Chelly Nader
群馬大学 工学部
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Sugizaki Taro
Fujitsu Laboratories Ltd.
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Suguro K
Toshiba Corporation Semiconductor Company
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Murakoshi A
Toshiba Corp. Yokohama Jpn
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Sawada Yoshie
Faculty Of Medicine Gunma University
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SAKAMAKI Tetsumo
Faculty of Medicine, Gunma University
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IDA Masato
Satellite Venture Business Laboratory. Gunma University
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Sakamaki Tetsumo
Faculty Of Medicine Gunma University
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KURITA Yasushi
Faculty of Engineering, Gunma University
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KOSHIBA Masaru
Faculty of Engineering, Gunma University
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Kurita Yasushi
Faculty Of Engineering Gunma University
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Koshiba Masaru
Faculty Of Engineering Gunma University
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Ida Masato
Satellite Venture Business Laboratory Gunma University
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Kurita Yoichiro
Tokyo Institute Of Technology Precision & Intelligence Laboratory
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Suguro Kyoichi
Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Murakoshi Atsushi
Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Ozawa Yoshio
Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
著作論文
- Effects of Red Blood Cells On Ultrasonic Wave Microbubble Trapping
- Characterization of Secondary Ultrasonic Waves Radiated from Bubbles Based on Small-Bubble Trapping Pattern Analysis
- Trapping of Micrometer Size Bubbles by Ultrasonic Waves
- Dual-Thickness Gate Oxidation Technology with Halogen/Xenon Implantation for Embedded Dynamic Random Access Memories
- Dual-Thickness Gate Oxidation Technology with Halogen/Xenon Implantation for Embedded DRAMs
- Dual-Thickness Gate Oxidation Technology with Halogen/Xenon Implantation for Embedded Dynamic Random Access Memories