Abe Takumi | Isobe R&d Center Shin-etsu Handotai
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概要
Isobe R&d Center Shin-etsu Handotai | 論文
- Self-Diffusion in Intrinsic and Extrinsic Silicon Using Isotopically Pure ^Silicon/Natural Silicon Heterostructures
- Self-Diffusion in Extrinsic Silicon Using Isotopically Enriched ^Si Layer : Semiconductors
- Epitaxial Growth of Pure ^Si Layers on a Natural Si(100) Substrate Using Enriched ^SiH_4
- Contribution of Polished Surface Waviness to Final SOI Thickness Uniformity of Bonded Wafers through PACE Process (Special Issue on SOI Devices and Their Process Technologies)
- Creation of Bonded SOI Substrates with CZ Silicon Higher than 1000Ωcm in Resistivity