Hsu Shih-lu | National Nano Device Laboratory
スポンサーリンク
概要
関連著者
-
CHIEN Chao-Hsin
National Nano Device Laboratories
-
Hsu Shih-lu
National Nano Device Laboratory
-
Chen Yi-cheng
Institute Of Electronics National Chiao-tung University
-
Chang Chun-yen
Institute Of Electronics National Chiao Tang University:national Nano-device Laboratories
-
Chen Ching-wei
Institute Of Electronics National Chiao-tung University
-
CHEN Ching-Wei
Institute of Electronics, National Chiao-Tung University
-
Chien Chao-Hsin
National Nano Device Laboratory, Hsinchu, 300, Taiwan
-
Chang Chun-Yen
Institute of Electronics, National Chiao-Tung University, Hsinchu, 300, Taiwan
-
Hsu Shih-Lu
National Nano Device Laboratory, Hsinchu, 300, Taiwan
著作論文
- Reliability of Strained SiGe Channel p-Channel Metal–Oxide–Semiconductor Field-Effect Transistors with Ultra-Thin ($\text{EOT}=3.1$ nm) N2O-Annealed SiN Gate Dielectric
- Deep Sub-Micron Strained Si_Ge_ Channel p-channel Metal-Oxide-Semiconductor Field-Effect Transistors (pMOSFETs) with Ultra-Thin N_2O-Annealed SiN Gate Dielectric
- Deep Sub-Micron Strained Si0.85Ge0.15 Channel p-channel Metal-Oxide-Semiconductor Field-Effect Transistors (pMOSFETs) with Ultra-Thin N2O-Annealed SiN Gate Dielectric