Ichikawa Masakazu | Mirai Project Advanced Semiconductor Research Center (asrc)
スポンサーリンク
概要
関連著者
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Nabatame Toshihide
Mirai Project Association Of Super-advanced Electronics Technology (aset)
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Toriumi Akira
Mirai Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Scienc
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Ichikawa Masakazu
Mirai Project Advanced Semiconductor Research Center (asrc)
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Horikawa Tsuyoshi
Mirai Project Association Of Super-advanced Electronics Technology (aset)
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Miyata Noriyuki
Mirai Project Advanced Semiconductor Research Center (asrc)
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Nabatame Toshihide
Mirai-association Of Super-advanced Electronics Technologies (mirai-aset) National Institute Of Adva
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Nabatame Toshihide
Hitachi Research Laboratory Hitachi Ltd.
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Toriumi Akira
Mirai-advanced Semiconductor Research Center (mirai-asrc) National Institute Of Advanced Industrial
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Toriumi A
Mirai Project Advanced Semiconductor Research Center (asrc)
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HORIKAWA Tsuyoshi
MIRAI-ASRC, AIST
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MIYATA Noriyuki
MIRAI, Advanced Semiconductor Research Center, National Institute of Advanced Industrial Science and
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Nabatame Toshihide
Superconductivity Research Laboratory International Superconductivity Technology Center
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Toriumi Akira
MIRAI Project, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), AIST Tsukuba Central 4, Tsukuba, Ibaraki 305-8562, Japan
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Nabatame Toshihide
MIRAI Project, Association of Super-Advanced Electronics Technology (ASET), AIST Tsukuba West 7, Tsukuba, Ibaraki 305-8569, Japan
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Horikawa Tsuyoshi
MIRAI Project, Association of Super-Advanced Electronics Technology (ASET), AIST Tsukuba West 7, Tsukuba, Ibaraki 305-8569, Japan
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Miyata Noriyuki
MIRAI Project, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), AIST Tsukuba Central 4, Tsukuba, Ibaraki 305-8562, Japan
著作論文
- Thermal Stability of a Thin HfO_2/Ultrathin SiO_2/Si Structure : Interfacial Si Oxidation and Silicidation
- Thermal Stability of a Thin HfO2/Ultrathin SiO2/Si Structure: Interfacial Si Oxidation and Silicidation