Shinjo Tetsuya | Electronic Materials Research Laboratories Nissan Chemical Industries Ltd.
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概要
関連著者
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Shinjo Tetsuya
Electronic Materials Research Laboratories Nissan Chemical Industries Ltd.
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Takei Satoshi
Electronic Materials Research Laboratories Nissan Chemical Industries Ltd.
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Sakaida Yasushi
Electronic Materials Research Laboratories Nissan Chemical Industries Ltd.
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Sakaida Yasushi
Electronic Materials Research Laboratories, Nissan Chemical Industries, Ltd., Toyama 939-2792, Japan
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Hashimoto Keisuke
Electronic Materials Research Laboratories, Nissan Chemical Industries, Ltd., Toyama 939-2792, Japan
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Ishii Kazuhisa
Electronic Materials Research Laboratories, Nissan Chemical Industries, Ltd., Toyama 939-2792, Japan
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Horiguchi Yusuke
Electronic Materials Research Laboratories, Nissan Chemical Industries, Ltd., 635 Sasakura, Fuchu-machi, Toyama 939-2792, Japan
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Takei Satoshi
Electronic Materials Research Laboratories, Nissan Chemical Industries, Ltd., Toyama 939-2792, Japan
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Shinjo Tetsuya
Electronic Materials Research Laboratories, Nissan Chemical Industries, Ltd., Toyama 939-2792, Japan
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Shinjo Tetsuya
Electronic Materials Research Laboratories, Nissan Chemical Industries, Ltd., 635 Sasakura, Fuchu-machi, Toyama 939-2792, Japan
著作論文
- Ultraviolet Cross-Link Gap Fill Materials and Planarization Applications for Patterning Metal Trenches in 32–45 nm Via First Dual Damascene Process
- Gap Fill Materials Using Cyclodextrin Derivatives in ArF Lithography
- Development of Developer-Soluble Gap Fill Materials for Planarization in Via-First Dual Damascene Process
- Study of High Etch Rate Bottom Antireflective Coating and Gap Fill Materials Using Dextrin Derivatives in ArF Lithography
- Characterization of Gap Fill Materials for Planarizing Substrate in Via-First Dual Damascene Lithography Process
- Study of Self Cross-Link Bottom Antireflective Coating and Gap Fill Materials for Sublimate Defect Reduction in ArF Lithography