Kim Do-heyoung | Faculty Of Applied Chemical Engineering And Research Institute For Catalysis Chonnam National Univer
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概要
- 同名の論文著者
- Faculty Of Applied Chemical Engineering And Research Institute For Catalysis Chonnam National Univerの論文著者
関連著者
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Kim Do-heyoung
Faculty Of Applied Chemical Engineering And Research Institute For Catalysis Chonnam National Univer
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Park Jin
Central Research Center Hyundai Microelectronics Co. Ltd.
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KIM Do-Heyoung
Faculty of Applied Chemistry and Research Institute for Catalysis, Chonnam National University
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Kim D‐h
Faculty Of Applied Chemical Engineering College Of Engineering Chonnam National University
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Whang Soon-hong
Central Research Center Hyundai Microelectronics Co. Ltd.
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Kim Jun
Central Research Center Hyundai Microelectronics Co. Ltd.
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KIM Byung
Central Research Laboratory, LG Semicon Co., Ltd.
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Kim Byung
Central Research Laboratory Lg Semicon Co. Ltd.
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Lee Wan-Jin
Faculty of Applied Chemistry and and Research Institute for Catalysis, Chonnam National University, 300 Youngbong-dong, KwangJu 500-757, Korea
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Kim Jun
Central Research Center, Hyundai Microelectronics Co., Ltd., 1 Hyangjeong-Dong, ChungJu 360-480, Korea
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Cho Dong-Lyun
Faculty of Applied Chemistry and and Research Institute for Catalysis, Chonnam National University, 300 Youngbong-dong, KwangJu 500-757, Korea
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Kim Do-Heyoung
Faculty of Applied Chemical Engineering and Research Institute for Catalysis, Chonnam National University, 300 Youngbong-dong, Kwangju 500-757, Korea
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Kim Do-Heyoung
Faculty of Applied Chemistry and and Research Institute for Catalysis, Chonnam National University, 300 Youngbong-dong, KwangJu 500-757, Korea
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Park Jin
Central Research Center, Hyundai Microelectronics Co., Ltd., 1 Hyangjeong-Dong, ChungJu 360-480, Korea
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Park Seoung
Faculty of Applied Chemical Engineering and Research Institute for Catalysis, Chonnam National University, 300 Youngbong-dong, Kwangju 500-757, Korea
著作論文
- Effect of N_2/H_2 Plasma Treatment on the Properties of TiN Films Prepared by Chemical Vapor Deposition from TiCl_4 and NH_3
- Conformality of Chemical-Vapor-Deposited Tungsten on TiN Prepared by Metal-organic Chemical Vapor Deposition via Cyclic Plasma Treatment
- Stability of Plasma Posttreated TiN Films Prepared by Alternating Cyclic Pulses of Tetrakis-Dimethylamido-Titanium and Ammonia