Jung Min-ho | Memory R&d Division Hyundai Electronics Industries Co. Ltd.
スポンサーリンク
概要
関連著者
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白 基鎬
Semiconductor Research Div. Hyundai Electronics Industries Co. Ltd.
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Baik K‐h
Hyundai Electronics Ind. Co. Ltd. Kyungki‐do Kor
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Jung M‐h
Samsung Electronics Co. Ltd. Gyungki‐do Kor
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Baik Ki-ho
Semiconductor Advanced Research Division Hyundai Electronics Industries Co. Ltd.
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Jung Min-ho
Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Baik Ki-ho
Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Baik Ki-ho
Memory R & D Division Hyundai Electronics Industries Co. Ltd.
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Jung Min-Ho
Memory R&D Division, Hyundai Electronics Industries Co., Ltd.
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Jung J‐c
Hyundai Electronics Ind. Co. Ltd. Kyoungki‐do Kor
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Bok Cheol-Kyu
Memory R&D Division, Hyundai Electronics Industries Co., Ltd.
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Bok C‐k
Hyundai Electronics Ind. Kyounki‐do Kor
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Lee G
Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Bok Cheol-Kyu
Memory R&D Division, Hyundai Electronics Industries Co., Ltd.
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BAIK Ki-Ho
Semiconductor Research Div., Hyundai Electronics Industries Co. Ltd.
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Hong Sung-eun
Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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JUNG Min-Ho
Semiconductor Advanced Research Division, Hyundai Electronics Industries Co. Ltd.
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JUNG Jae-Chang
Semiconductor Advanced Research Division, Hyundai Electronics Industries Co. Ltd.
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LEE Geunsu
Semiconductor Advanced Research Division, Hyundai Electronics Industries Co. Ltd.
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JUNG Jae-Chang
Memory R&D Division, Hyundai Electronics Industries Co., Ltd.
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LEE Geunsu
Memory R&D Division, Hyundai Electronics Industries Co., Ltd.
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Jung Jae-Chang
Memory R&D Division, Hyundai Electronics Industries Co., Ltd.
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Lee Geunsu
Memory R&D Division, Hyundai Electronics Industries Co., Ltd.
著作論文
- Environmentally stable chemically amplified positive resist containing vinyllactam terpolymers
- Environmentally stable chemically amplified positive resist containing vinyllactam terpolymers
- A Novel Alicyclic Polymers for 193nm Single Layer Resist Materials
- Synthesis and Characterization of Alicyclic Polymers with Hydrophilic Groups for 193 nm Single-Layer Resist
- Novel Organic Bottom Antireflective Coating Materials for 193nm Lithography