Hong Sung-eun | Memory R&d Division Hyundai Electronics Industries Co. Ltd.
スポンサーリンク
概要
関連著者
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白 基鎬
Semiconductor Research Div. Hyundai Electronics Industries Co. Ltd.
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Baik K‐h
Hyundai Electronics Ind. Co. Ltd. Kyungki‐do Kor
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Hong Sung-eun
Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Baik Ki-ho
Semiconductor Advanced Research Division Hyundai Electronics Industries Co. Ltd.
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Jung J‐c
Hyundai Electronics Ind. Co. Ltd. Kyoungki‐do Kor
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BAIK Ki-Ho
Semiconductor Research Div., Hyundai Electronics Industries Co. Ltd.
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KIM Hyeong-Soo
Semiconductor Advanced Research Division, Hyundai Electronics Industries Co. Ltd.
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Kim H‐s
Sung Kyun Kwan Univ. Suwon Kor
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Kim H‐s
Hynix Semiconductor Inc. Kyoungki‐do Kor
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JUNG Jae-Chang
Semiconductor Advanced Research Division, Hyundai Electronics Industries Co. Ltd.
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Ahn Jae-yong
Semiconductor Advanced Research Division Hyundai Electronics Industries Co. Ltd.
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Roh Chi-hyeong
Semiconductor Advanced Research Division Hyundai Electronics Industries Co. Ltd.
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Kim Hyeong-soo
Semiconductor Advanced Research Division Hyundai Electronics Industries Co. Ltd.
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Hong Sung-Eun
Semiconductor Advanced Research Division, Hyundai Electronics Industries Co., Ltd.
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Baik Ki-ho
Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Baik Ki-ho
Memory R & D Division Hyundai Electronics Industries Co. Ltd.
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Jung Min-Ho
Memory R&D Division, Hyundai Electronics Industries Co., Ltd.
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Jung M‐h
Samsung Electronics Co. Ltd. Gyungki‐do Kor
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Jung Min-ho
Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Lee G
Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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JUNG Jae-Chang
Memory R&D Division, Hyundai Electronics Industries Co., Ltd.
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LEE Geunsu
Memory R&D Division, Hyundai Electronics Industries Co., Ltd.
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Jung Jae-Chang
Memory R&D Division, Hyundai Electronics Industries Co., Ltd.
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Lee Geunsu
Memory R&D Division, Hyundai Electronics Industries Co., Ltd.
著作論文
- Sub-100nm Lithographic Performance of Novel Electron Beam Resist
- Sub-100nm Lithographic Performance of Novel Electron Beam Resist
- Sub-100nm Lithographic Performance of Novel Electron Beam Resist
- Novel Organic Bottom Antireflective Coating Materials for 193nm Lithography