WAKIYA Naoki | Tokyo Institute of Technology, Department of Metallurgy and Ceramics Science
スポンサーリンク
概要
関連著者
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Shinozaki K
Tokyo Inst. Technol. Tokyo Jpn
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WAKIYA Naoki
Tokyo Institute of Technology, Department of Metallurgy and Ceramics Science
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SHINOZAKI Kazuo
Tokyo Institute of Technology, Department of Metallurgy and Ceramics Science
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MIZUTANI Nobuyasu
Tokyo Tech.
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SAIKI Atsushi
Tokyo Institute of Technology, Center for Advanced Materials Analysis
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KIGUCHI Takanori
Tokyo Institute of Technology, Center for Advanced Materials Analysis
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FUJITO Keisuke
Tokyo Institute of Technology, Depeartment of Metallurgy and Ceramics Science
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MIZUKAMI Satoshi
Tokyo Institute of Technology, Department of Metallurgy and Ceramics Science
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SHIMIZU Kan
Tokyo Institute of Technology, Department of Metallurgy and Ceramics Science
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MIZUTAN Nobuyasu
Tokyo Institute of Technology, Department of Metallurgy and Ceramics Science
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YAMADA Tomoaki
Tokyo Institute of Technology Department of Metallurgy and Ceramics Science
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KONDO Masao
Fujitsu Laboratories Ltd.
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KURIHARA Kazuaki
Fujitsu Laboratories Ltd.
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CHIU Te
Tokyo Institute of Technology, Department of Metallurgy & Ceramics Science, Graduate School of Scien
著作論文
- 21-P-03 Direct Observation of Unequal Lattice Change of Ceramics Thin Films at High Temperature due to Film Thickness and Substrate
- 21-O-05 In-Situ TEM Analysis of Crystallization Process of Zirconia/Silicon Heterostructure
- 15-P-02 Effect of Source Supply Patterns on Microstructure and Crystallinity of PZT Thin Film using Pulsed MOCVD Method
- 15-P-01 Modification of Drain Current of MOS-FET by the Remanent Magnetization for New Memory
- 15-O-03 HRTEM Investigation of Interface Structure of Y-Ta Co-Doped Zirconia/Silicon Heterostructure
- 15-O-02 Low Temperature Epitaxial Growth of Ceramic Thin Film Using Nano-Metwe-Thick Buffer Layers
- 06-P-07 Effect of the Surface Atomic Layers of the Substrate on Perovskite Structure Development and Epitaxial Growth of PMN and PZN Based Thin Films
- 06-P-04 Preparation of Ba_Y_Nb_2O_6 Thin Films by RF Magnetron Sputtering