Kakimi A | Texas Instruments Japan Ltd. Ibaraki Jpn
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概要
Texas Instruments Japan Ltd. Ibaraki Jpn | 論文
- Control of Crystalline Structure and Electrical Properties of TaSiN Thin Film Formed by Reactive RF-Sputtering
- Oxygen Plasma Damage in GaAs Directly Exposed to Surface-Wave Plasma
- Evaluation of Oxygen-Plasma Damage in GaAs Exposed to a Surface-Wave Plasma Source Developed for the Ashing Process : Nuclear Science, Plasmas, and Electric Discharges
- Sharp Optical Emission from CuInSe_2 Thin Films Grown by Molecular Beam Epitaxy
- Molecular Beam Epitaxial Growth and Properties of CuInSe_2